兑水 发表于 2009-12-6 16:40:27

ASTM F 2113-2001 薄膜电子设备用高纯度金属溅涂靶杂...

F2113-01e1 Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
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