陈宇航 黄文浩
中国科学技术大学精密机械与精密仪器系,安徽合肥230026
摘 要:对扫描探针显微镜(SPM)仪器漂移的定量测量的几种方法进行探讨,提出应用二维零位标记进行漂移测量.分析比较使用普通样品、周期二维光栅、二维零位标记和原子光栅在测定仪器漂移中的优缺点.结果表明:应用二维零位标记的测量技术对探针与样品形貌耦合引起的图像误差不敏感,漂移测量范围不受光栅单元尺寸影响.该方法优于采用普通样品和规则周期的二维光栅样品的方法,而应用原子光栅可以预计达到亚原子量级的超高精度的SPM漂移测量.[著者文摘]
Methods for quantitative measurement of drift in scanning probe microscopyCHEN Yu-hang, HUANG Wen-hao Department of Precision Machinery and I , University of Science and Technology of China ,Hefei 230026,ChinaAbstract:Several quantitative drift measurement techniques for scanning probe microscopy (SPM) were introduced. A new method using two-dimensional zero-reference masks was proposed to measure the SPM drift. Four techniques used in drift measurement were compared. They were based on imaging normal sample, periodical regular pattern, zero-reference mask and atomic grating respectively. Results showe that when using zero-reference grating it is not sensitive to tip-induced artifacts in images and the measuring range is not affected by the width of grating element. Thus, this method is superior to the one based on imaging normal samples or regular patterns, while using atomic grating could be expected to obtain sub-atomic resolution for drift measurement.[著者文摘]
Key words:nanometrology; scanning probe microscopy; drift |
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